Nano-scratch test for POSS films based on vinyltrimethoxysilane and modified with titanium tetrabuto

• 作 者: 陈平 胡立江 刘金成 崔津津
• 机 构: ChemstryCenter,Dept.ofAppliedChemistry,Dept.ofOptoelectronicScienceandTechnology
• 出 处: 哈尔滨工业大学学报：英文版
• 发表日期: 2005年2期
• 关键词: VMS 钛化合物 溶胶过程 摩擦测试 POSS薄膜 polyhedral oligomeric silsesquioxanes (POSS) vinyltrim
• 基金项目: Sponsored by the Foundation of the Department of Science and Technology,and the Department of Education,the Government of Heilongjiang Province

Polyhedral oligomeric Silsesquioxanes (POSS) derived from vinyltrimethoxysilane (VMS) and modified with titanium tetrabutoxide (TTBO) (PVT) were prepared by sol-gel process catalyzed by hydrochloric acid ( molar ratio: [ HCl ]/Si = 0. 05 ), and heating at