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控制气氛光谱分析是利用气体的不同物理及化学特性,改善放电区域中的光辐射作用。本文设计了两种控制气氛气室,试验了以Ar与O_2及Ar与CO_2作为控制气氛时对难熔金属氧化物中难熔杂质的有关条件,制订了五种分析方法。这些方法,由于利用了控制气氛,提高了对难熔杂质的蒸发速度,压抑了主体影响,给出了良好的激发条件,降低了背景,消除了氰带,从而提高了Ta,Nb,Zr,Hf氧化物中难熔杂质元素如Ti,Al,V,Zr,Mo,W,Nb,Ta的分析灵敏度。
Controlled atmosphere spectroscopy uses the different physical and chemical properties of the gas to improve the optical radiation in the discharge area. In this paper, two kinds of controlled atmosphere chambers were designed. Five kinds of analytical methods were developed for the refractory impurities in refractory metal oxides with Ar and O_2 and Ar and CO_2 as control atmosphere. These methods, due to the use of a controlled atmosphere, increase the evaporation rate of refractory impurities, suppress the influence of the host, give good excitation conditions, reduce the background, eliminate the cyanide zone, thereby increasing the Ta, Nb, Zr, Analysis sensitivity of refractory impurity elements such as Ti, Al, V, Zr, Mo, W, Nb, Ta in Hf oxide.