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本文报道应用古代“魔镜”成像原理和现代激光技术发展起来的一种新的光反射“魔镜”检测技术。采用这项技术可以非常直观、方便地观测到直径小于１５０ｍｍ的硅抛光片及硅外延片表面存在的缺陷情况，其分辨率为０．５μｍ。由于光反射“魔镜”检测技术是一种新型的光学无损检测技术，具有探测灵敏度高、快速、无破坏性、大面积检测等优点，该项检测技术将会有更加广泛的应用前景。
This article reports a new light reflection “magic mirror” detection technology developed by using the ancient “magic mirror” imaging principle and modern laser technology. Using this technology can be very intuitive and easy to observe the diameter of less than 150mm silicon polishing wafer and silicon epitaxial wafer surface defects, the resolution of 0.5μm. As the light reflection “magic mirror” detection technology is a new type of optical non-destructive testing technology, with high detection sensitivity, fast, non-destructive, large area detection, etc., the detection technology will have a more extensive application prospects.