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介绍了利用AZ4620光刻胶制作截面为5μm×5μm微电镀模的工艺流程,详细说明了工艺流程中影响实验结果的实验参数以及实验参数的优化方法,并用实验结果说明了应该避免的实验误区。最后根据优化后的参数制作出满足课题需要的实验结果。
The technological process of making micro-electroplating die with 5μm × 5μm cross-section by AZ4620 photoresist is introduced. The experimental parameters affecting the experimental results and the optimization method of the experimental parameters are described in detail. And the experimental errors are explained by the experimental results. Finally, according to the optimized parameters to produce the experimental results to meet the needs of the subject.