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在CH4/H2气氛下,利用直流热阴极PCVD(plasma chemical vapor deposition)设备,在高CH4流量下制备纳米金刚石膜。对制备的样品通过扫描电子显微镜、拉曼光谱仪、X射线衍射仪对其进行表征。结果表明:随着CH4流量的增加,晶粒尺寸明显减小,表面变得更加平滑,但非金刚石相增多,膜的品质下降。同时CH4流量增加,促进了(110)面的生长,当CH4流量达到12 sccm,具有(110)方向的择优取向。
In a CH4 / H2 atmosphere, a nano-diamond film was prepared at a high CH4 flow rate using a DCVD (plasma CVD) apparatus. The prepared samples were characterized by scanning electron microscopy, Raman spectroscopy and X-ray diffractometry. The results show that with the increase of CH4 flow rate, the grain size decreases obviously and the surface becomes smoother, but the non - diamond phase increases and the quality of the film decreases. At the same time, the flow of CH4 increased and the growth of (110) surface was promoted. When CH4 flow reached 12 sccm, the preferred orientation was (110).