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采用磁控溅射方法在Si(111)基片上制备金属锰膜,用椭圆偏振光谱在入射光子能量为2.0—4.0 eV范围内研究了溅射功率对薄膜光学性质的影响.利用德鲁得-洛伦兹色散模型对椭偏数据进行拟合,结果表明在测量范围内随溅射功率增加薄膜的折射率减小;消光系数随入射光子能量增加先增加后减小,在3.0 eV附近处出现极大值,并且极大值所处的位置随溅射功率增加而向低能方向移动,这主要与溅射沉积的锰薄膜的质量有关,且随溅射功率的增加薄膜的消光系数逐渐趋近于金属锰的数值.研究结果还表明溅射功率的增加减少了薄膜中的空隙,有利于薄膜的生长.
The effects of sputtering power on the optical properties of the films were investigated by magnetron sputtering on Si (111) substrates with elliptical polarization spectra at an incident photon energy of 2.0-4.0 eV. The Druid- Lorentzian chromatic dispersion model fitted the ellipsometric data. The results show that the refractive index decreases with the increase of sputtering power in the measurement range. The extinction coefficient increases first and then decreases with the increase of incident photon energy, and appears near 3.0 eV Maximum, and the position of the maximum moved with the sputtering power in the direction of low energy, which was mainly related to the quality of the deposited sputtered manganese film. The extinction coefficient of the film gradually approached with the increase of sputtering power The results also show that the increase of sputtering power reduces the voids in the film, which is beneficial to the growth of the film.