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Nanowires require surface passivation due to their inherent large surface to volume ratio.We investigate the effect of embedding InP nanowires in different oxides with respect to surface passivation by use of electron beam induced current measurements enabled by a nanoprobe based system inside a scanning electron microscope.The measurements reveal remote doping due to fixed charge carriers in the passivating POx/Al2O3 shell in contrast to results using SiOx.We used time-resolved photoluminescence to characterize the lifetime of charge carriers to evaluate the success of surface passivation.In addition,spatially resolved internal quantum efficiency simulations support and correlate the two applied techniques.We find that atomic-layer deposited POx/Al2O3 has the potential to passivate the surface of InP nanowires,but at the cost of inducing a field-effect on the nanowires,altering their electrostatic potential profile.The results show the importance of using complementary techniques to correctly evaluate and interpret processing related effects for optimization of nanowire-based optoelectronic devices.