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ITO透明导电膜玻璃的翘曲度是评价大尺寸薄基片ITO玻璃的重要指标之一。利用磁控射频溅射技术制备了ITO薄膜。研究了基片加热前、后的翘曲度和ITO膜层应力对ITO玻璃翘曲度的影响以及ITO成膜温度分布对ITO玻璃翘曲度的影响。结果表明,薄基片ITO玻璃的翘曲度主要是在镀膜时ITO膜层压应力大引起的,选择合适的成膜温度分布可明显减小ITO玻璃的翘曲度。
The warpage degree of ITO transparent conductive film glass is one of the important indexes to evaluate the ITO glass of large size thin substrate. ITO films were prepared by magnetron RF sputtering. The influence of warpage and the stress of ITO film on the warpage of ITO glass and the effect of ITO film temperature on the warpage of ITO glass were studied. The results show that the warpage of thin ITO glass is mainly caused by the lamination stress of the ITO film during the coating. Choosing a suitable film temperature distribution can significantly reduce the warpage of the ITO glass.