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本文分析了衬底杂质的蒸发—吸附—扩散—并入过程,着重分析了滞流层中杂质的分布形式,从而导出了自掺杂分布的一种表达形式。由此可以解释自掺杂效应与衬底和工艺条件等因素的关系。某些研究结果可以看成是本文结果在不同情况下的近似。
In this paper, the evaporation-adsorption-diffusion-incorporation process of substrate impurities is analyzed. The distribution of impurities in the stagnant layer is emphatically analyzed, and an expression of self-doping distribution is derived. This can explain the self-doping effect and substrate and process conditions and other factors. Some research results can be seen as an approximation of the results of this paper under different circumstances.