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本文用X射线光电子能谱(XPS)研究了NO在80—290°K之间与Ni和预先氧化Ni表面的相互作用。结果表明,改变吸附温度和预先对Ni表面进行氧化,能控制表面活性及其与NO之间的相互作用,并导致表面上有两类构型不同的NO分子吸附态及其解离态的生成,其中一类为弱吸附“立式”NO,另一类为强吸附“弯式”NO。此外,在80°K时吸附的表面,特别是在290°K预先氧化后的Ni表面,在80°K与NO相互作用后的表面上有催化产物N_2O生成。
In this paper, X-ray photoelectron spectroscopy (XPS) was used to study the interaction of NO between Ni and pre-oxidized Ni surface at 80-290 ° K. The results show that changing the adsorption temperature and pre-oxidation of the Ni surface can control the surface activity and the interaction with NO and lead to the formation of two kinds of adsorbed states and dissociation states of NO on the surface , One of them is weak adsorption “vertical” NO, and the other is strong adsorption “curved” NO. In addition, the surface adsorbed at 80 ° K, especially at 290 ° K pre-oxidized Ni surface, has a catalytic product N 2 O formation on the surface after 80 ° K interaction with NO.