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对聚N-乙烯咔唑(PVK)和四溴化碳体系的电荷转移复合物在紫外光照射下光解的化学过程反应进行了研究。顺磁共振谱证明,这种光化学反应是属自由基反应过程。这种光解反应生成聚N-乙烯咔唑阳离子自由基和四溴化碳阴离子自由基,同时放出质子酸H~+·聚N-乙烯咔唑阳离子自由基与四溴化碳进一步反应产生3-溴代聚N-乙烯咔唑。利用这些光化学反应,我们以聚N-乙烯咔唑为主要原料研制出一种光敏显示材料——PVK光敏片,其中PVK是经过改性的,成本比较便宜。采用不同的酸敏指示剂可获得多种变色片。
The chemical reaction of photodissociation of charge-transfer complexes of poly (N-vinylcarbazole) (PVK) and carbon tetrabromide (CTC) with UV irradiation was studied. Paramagnetic resonance spectroscopy proved that this photochemical reaction is a radical reaction process. The photolysis reaction generates poly (N-vinylcarbazole) cation and carbon tetrabromide anion radicals, and the proton acid H + + poly (N-vinylcarbazole) cation radical is liberated to further react with carbon tetrabromide to generate 3 Brominated poly-N-vinyl carbazole. Using these photochemical reactions, we developed a photosensitive display material, PVK, using poly (N-vinylcarbazole) as the main raw material, of which PVK was modified and its cost was relatively low. Using a variety of acid sensitivity indicator can be obtained a variety of color tablets.