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研究了工作气压对磁控溅射法制备CIGS薄膜的影响,采用X射线衍射,扫描电镜,X射线萤光光谱和X射线能量色散谱分析了膜层的组织和成分。研究发现,工作气压升高,薄膜沉积速率降低。当工作气压低于0.2 Pa时,薄膜致密均一;高于0.2 Pa表面出现Cu2-xSe相,并随气压升高在膜表面的覆盖面积增大。对气压影响薄膜表面形貌的机理采用成膜动力学理论进行了讨论。
The effects of working pressure on the CIGS thin films prepared by magnetron sputtering were studied. The microstructure and composition of the films were analyzed by X-ray diffraction, scanning electron microscopy, X-ray fluorescence spectroscopy and X-ray energy dispersive spectroscopy. The study found that working pressure increased, the film deposition rate decreased. When the operating pressure is lower than 0.2 Pa, the film is dense and uniform; Cu2-xSe phase appears on the surface above 0.2 Pa, and the surface area of the film increases with increasing pressure. The mechanism of the influence of air pressure on the film surface morphology is discussed using the film formation kinetics theory.