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利用纳米球刻蚀法制备二维银纳米阵列的过程中,不同的物理气相沉积方法得到的银纳米阵列结构形貌不同。其中电阻热蒸发沉积得到完整三角形状的二维银纳米阵列,而磁控溅射沉积得到蜂窝状银纳米阵列。同时在沉积过程中通过改变金属粒子沉积方向也可获得结构不同的银纳米阵列,其中将基片固定,使蒸发源垂直沉积时制备出的二维银纳米阵列更加致密、完整。最后吸收光谱验证了采用电阻热蒸发垂直沉积时得到结构完整且面积较大的银纳米阵列,以上研究为二维银纳米阵列的应用提供了条件。
In the process of preparing two-dimensional silver nano-arrays by nanosphere etching, the morphology of the silver nano-arrays obtained by different physical vapor deposition methods is different. The resistance thermal evaporation deposition to obtain a complete triangular two-dimensional silver nano-array, and magnetron sputtering deposition honeycomb silver nano-array. At the same time, silver nano-arrays with different structures can also be obtained by changing the deposition direction of the metal particles in the deposition process. The two-dimensional silver nano arrays prepared by vertical deposition of the evaporation source are more compact and complete. Finally, the absorption spectra verify that silver nano-array with a complete structure and large area is obtained when vertical thermal resistance is deposited by thermal resistance. The above research provides the conditions for the application of two-dimensional silver nano-array.