噻吩在猝冷骨架Ni上吸附脱硫的XPS研究

• 作 者: 谢福中 胡华荣 乔明华 闫世润 范康年 雷浩 谭大力 包信和 宗保宁 张晓昕
• 机 构: 上海市分子催化和创新材料重点实验室,上海市分子催化和创新材料重点实验室,上海市分子催化和创新材料重点实验室,上海市分子催化和创新材料重点实验室,上海市分子催化和创新材料重点实验室,中国科学院大连化学物
• 出 处: 高等学校化学学报
• 发表日期: 2006年09期
• 关键词: 猝冷镍 噻吩 吸附脱硫 X射线光电子能谱(XPS)

采用X射线光电子能谱(XPS)研究了室温下噻吩在猝冷骨架Ni吸附剂上的吸附及受热分解行为.研究结果表明,298K时噻吩首先在吸附剂表面发生C—S键断裂,生成原子硫及含金属的有机环状化合物.当吸附剂表面完全被解离物种覆盖后,发生噻吩的多层物理吸附.加热至373K,大部分物理吸附的噻吩直接脱附,其余部分在碳物种脱附后暴露的Ni表面上发生解离.473K时表面的碳物种消失,而残留在样品上的硫均转化为硫化镍.

X-ray photoelectron spectroscopy (XPS) was used to study the adsorption and thermal decomposition behavior of thiophene at room temperature on Ni sorbents with quenched framework. The results show that at 298K, thiophene first breaks off C-S bonds on the surface of adsorbents and generates atoms Sulfur and metal-containing organic cyclic compounds. When the adsorbent surface is completely covered by the dissociated species, multi-layer physical adsorption of thiophene occurs.Heat to 373K, most of the physically adsorbed thiophene desorption, the rest of the carbon species off The dissociated dissociation occurs on the surface of the post-exposed Ni, and the surface carbon species disappear at 473K, while the sulfur remaining on the sample is converted to nickel sulphide.