Topologically patterning of polyvinyl alcohol microstructures for vertical-/hybrid-aligned nematic l

• 作 者: 杨璨 李森森 李文松 左海杰 陈鹭剑 张保平 蔡志平
• 机 构: Department of Electronic Engineering, School of Information Science and Engineering,Xiamen Universit
• 出 处: Chinese Optics Letters
• 发表日期: 2015年08期
• 关键词: aligned polyvinyl nematic alcohol alignment lithography fabrication doping desir

We demonstrate a soft lithography approach for fabrication of a topographically patterned polyvinyl alcohol(PVA) liquid-crystal(LC) alignment layer. This specific approach employs modified micromolding in capillaries for negative replication of the PVA microstructures on indium tin oxide(ITO) substrates from patterned poly(dimethylsiloxane) molds in a single step, leading to planar alignment on the desired regions. By doping with polyhedral oligomeric silsesquioxane nanoparticles, which can induce vertical alignment on bare ITO surfaces,periodic LC phase gratings based on an alternating vertical-aligned/hybrid-aligned nematic geometry are presented as an application, and a theoretical model was used to simulate and examine the experimental results.

This specific approach employs modified modified micromolding in capillaries for negative replication of the PVA microstructures on indium tin oxide (ITO) substrates from By doping with polyhedral oligomeric silsesquioxane nanoparticles, which can induce vertical alignment on bare ITO surfaces, periodic LC phase gratings based on an alternating vertical-aligned / hybrid-aligned nematic geometry are presented as an application, and a theoretical model was used to simulate and examine the experimental results.