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采用Ti/W复合靶 ,用多弧离子镀技术沉积了Ti-W -N多元多层膜 ,并对其组织结构与性能进行了研究 .结果表明 :在本试验条件下多元膜的结构形式为 (Ti,W ) 2 N ,最佳多层膜的结构形式为基体 /Ti/TiN/ (TiyW1-y)N/ (Ti,W) 2 N ,并具有较高的显微硬度和极低的孔隙率 ,在 80 0℃具有很好的抗氧化性能 .在沉积过程中存在着多元合金膜层与复合靶的成分离析现象 ,这与靶材的结构有关 .
Ti-W-N multilayer films were deposited by multi-arc ion plating using Ti / W composite target and the microstructure and properties of the films were investigated.The results show that the structure of the multi-layer films under the experimental conditions is (Ti, W) 2 N. The optimal multilayer structure is Ti / TiN / (TiyW1-y) N / (Ti, W) 2 N with high microhardness and very low Porosity has a good oxidation resistance at 80 0 C. There is a phenomenon of component segregation between the multi-layer alloy film and the composite target in the deposition process, which is related to the structure of the target.