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采用恒流和梯度电流两种方式对TC4钛合金进行微弧氧化,微弧氧化液组成和工艺参数为:Na2SiO3 16 g/L,(NaPO3)68 g/L,NaF 2 g/L,频率500 Hz,占空比10%。研究了不同电流模式下电压随微弧氧化时间的变化。对比研究了两种电流模式下所得微弧氧化膜的表面形貌、厚度、粗糙度、显微硬度等性能。结果表明,恒流模式下,随电流密度升高,氧化膜层的终止电压、厚度、粗糙度和表面微孔直径增大,显微硬度先增大后减小;与恒流模式膜层相比,梯度电流模式下所得氧化膜层较厚,粗糙度较低,硬度高,表面微孔直径较小。较适宜的恒流电流密度和梯度电流密度分别为10 A/dm2和15–5 A/dm2,而后者所得膜层的综合性能优于前者所得膜层。
The composition and process parameters of micro-arc oxidation solution were as follows: Na2SiO3 16 g / L, (NaPO3) 68 g / L, NaF 2 g / L and frequency 500 Hz, duty cycle 10%. The voltage changes with the micro-arc oxidation time under different current mode were studied. The surface morphology, thickness, roughness, microhardness and other properties of the micro-arc oxidation films obtained by the two current modes were compared. The results show that with the increase of current density, the final voltage, thickness, roughness and pore diameter increase with the increase of current density in the constant current mode. The microhardness first increases and then decreases with the increase of the current density. Compared with the gradient current mode, the resulting oxide film is thicker, with lower roughness, higher hardness and smaller surface micropore diameter. The more suitable constant current density and gradient current density are 10 A / dm2 and 15-5 A / dm2, respectively, while the latter is better than the former.