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磨粒结构在化学机械抛光(CMP)过程中发挥重要作用.利用化学沉积技术在聚甲基丙烯酸甲酯(PMMA)表面嫁接氧化铈(CeO2)纳米粒子,得到了核壳结构的PMMA-CeO2复合颗粒.借助X射线衍射、傅里叶转换红外光谱、场发射扫描电镜、透射电镜和选区电子衍射等手段对样品结构进行表征.结果 表明,硝酸铈用量对CeO2复合颗粒的壳层厚度及均匀性具有明显影响.以氧化硅片作为加工对象,利用原子力显微镜对比了PMMA-CeO2复合磨粒与商用CeO2纳米粒子的抛光特性,发现所得复合磨粒有助于消除划痕和改善表面质量.且随着抛光垫硬度的降低和抛光压力的减小,抛光表面粗糙度和轮廓起伏均随之降低.本文旨在为通过优化工艺参数提高复合磨粒的抛光效果提供实验和理论依据.“,”Abrasive structure plays an important role in chemical mechanical polishing (CMP) processes.The uniform polymethylmethacrylate (PMMA) sphere surfaces were grafted with ceria (CeO2) nano-particles via the chemical deposition technique,and the core-shell structured PMMA-CeO2 composite particles were synthesized.The structures of the obtained samples were characterized by X-ray diffraction,Fourier transform infrared spectroscopy,field emission scanning electron microscopy,transmission electron microscopy and selected area electron diffraction techniques.The result shows that the influences of the amount of the cerium nitrate on the shell thickness and uniformity of CeO2 composite particles are obviously.With the oxidized silicon wafers as the processing object,the polishing characteristics of PMMA-CeO2 composite abrasives and commercial CeO2 nano-particles were compared by the atomic force microscope.The experimental results indicate that the obtained composite abrasives contribute to scratch elimination and improvement of the surface quality.Furthermore,the polished surface roughness and topographical variation decrease with the decrease of polishing pad hardness and the reduction of the applied polishing pressure.The work aims to provide an experimental and theoretical basis for improving the polishing effect of composite abrasives by optimizing process parameters.