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片状放大器腔内钕玻璃表面的洁净度是保证放大器高工作性能和长寿命的关键指标,而合理的腔内流场分布是放大器保持腔内洁净的前提条件。运用计算流体力学方法,利用Fluent软件对纯氮气冲洗片状放大器过程中的腔内流场进行模拟,并在样机上验证了模型的有效性;通过调整放大器的进出气口结构及位置排布,获得了最佳的流场分布。实验结果表明,相比未优化放大器,优化后的放大器仅使用一半时间就可以达到相同的腔内洁净度等级,且钕玻璃表面洁净度更高。
The cleanness of neodymium glass surface in the chip amplifier cavity is the key index to ensure the high work performance and long life of the amplifier, and the reasonable intracavity flow field distribution is the prerequisite for the amplifier to keep the cavity clean. The computational fluid dynamics (CFD) method was used to simulate the cavity flow field during pure nitrogen gas flushing using Fluent software. The validity of the model was verified on a prototype. By adjusting the inlet and outlet configuration of the amplifier and its position arrangement, The best flow field distribution. Experimental results show that the optimized amplifier achieves the same level of intracavity cleanliness in only half the time compared to an unoptimized amplifier, and the neodymium glass surface is more clean.