论文部分内容阅读
采用射频磁控溅射工艺在Si基体上制备了TiN/Si3N4纳米复合结构涂层。对不同溅射气压、基片温度以及N2/Ar气流比条件下制备的TiN/Si3N4纳米复合涂层的结构和性能进行了研究和分析。结果表明:溅射气压、基片温度和N2/Ar气流比对TiN/Si3N4涂层的断面结构和力学性能均有显著影响,当溅射气压为0.4 Pa、沉积温度为300℃、N2/Ar气流比为5∶38时,涂层可获得最大硬度为34.4 GPa。
TiN / Si3N4 nanocomposite coatings were prepared on Si substrate by RF magnetron sputtering. The structure and properties of TiN / Si3N4 nanocomposite coatings prepared under different sputtering pressures, substrate temperature and N2 / Ar gas flow ratio were studied and analyzed. The results show that the sputtering pressure, the substrate temperature and the flow ratio of N2 / Ar have a significant effect on the cross-sectional structure and mechanical properties of TiN / Si3N4 coatings. When the sputtering pressure is 0.4 Pa, the deposition temperature is 300 ℃, N2 / Ar When the air flow ratio is 5:38, the maximum hardness of the coating is 34.4 GPa.