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采用脉冲激光沉积法在石英基片上沉积制备了ZrW2O8薄膜.用X射线衍射仪(XRD)、原子力显微镜(AFM)研究了不同衬底温度对薄膜结构组分、表面粗糙度和形貌的影响,用台阶仪和分光光度计测量薄膜的厚度和不同衬底温度下制备薄膜的透射曲线,用变温XRD分析了ZrW2O8薄膜的负热膨胀特性.实验结果表明:在衬底温度为室温、550℃和650℃下脉冲激光沉积的ZrW2O8薄膜均为非晶态,非晶膜在1200℃保温3min后淬火得到立方相ZrW2O8薄膜;随着衬底温度的升高,ZrW2O8薄膜的表面粗糙度明显降低;透光率均约为80%,在20～600℃温度区间内,脉冲激光沉积制备的ZrW2O8薄膜的负热膨胀系数为-11.378×10-6 K-1.
ZrW2O8 thin films were deposited on quartz substrates by pulsed laser deposition.The effects of different substrate temperatures on the composition, surface roughness and morphology of the films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM) The thickness of thin film and the transmission curve of the prepared films were measured by using stepper and spectrophotometer, and the negative thermal expansion characteristics of ZrW2O8 thin films were analyzed by temperature-programmed X-ray diffraction (XRD). The experimental results show that when the substrate temperature is 550 ℃ and 650 The ZrW2O8 thin films deposited by pulsed laser deposition were all amorphous. The amorphous films were quenched at 1200 ℃ for 3min, then the ZrW2O8 thin films were obtained. The surface roughness of ZrW2O8 thin films decreased with the substrate temperature increasing. The average thermal expansion coefficient of ZrW2O8 films prepared by pulsed laser deposition was -11.378 × 10-6 K-1 in the temperature range of 20 ~ 600 ℃.