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实验结果表明Ta/NiFe/FeMn/Ta多层膜的交换耦合场Hex要大于Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜中的Hex。为了寻找其原因,用X射线光电子能谱(XPS)研究了Ta(12nm)/NiFe(7um),Ta(12um)/NiFe(7um)/Cu(4um)和Ta(12um)/NiFe(7um)/Cu(3um)/NiFe(5um)3种样品,研究结果表明前两种样品表面无任何来自下层的元素偏聚,但在第3种样品最上层的NiFe表面上,探测到从下层偏聚上来的Cu原子,认为:Cu在NiFe/FeMn层间的存在是Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜的Hex低于Ta/NiFe/FeMn/Ta多层膜Hex的一个重要原因。
Experimental results show that the exchange coupling field Hex of Ta / NiFe / FeMn / Ta multilayers is larger than that of Ta / NiFe / Cu / NiFe / FeMn / Ta multilayers. In order to find out the reason, Ta (12nm) / NiFe (7um), Ta (12um) / NiFe (7um) / Cu (4um) and Ta (12um) / NiFe (7um) were studied by X-ray photoelectron spectroscopy / Cu (3um) / NiFe (5um). The results show that there is no segregation of elements from the lower layer on the surface of the first two samples. However, on the NiFe surface of the third sample, the segregation from the lower layer , It is considered that the presence of Cu in the layer of NiFe / FeMn is that Hex of the Ta / NiFe / Cu / NiFe / FeMn / Ta spin valve multilayer film is lower than that of the Ta / NiFe / FeMn / Ta multilayer film Hex An important reason.