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通过分子束外延(MBE)和脉冲激光沉积(PLD)方法,将1—10个Fe原子层(ML)以楔形方式沉积到反铁磁单晶NiO(001)基片上.表面磁光克尔效应的原位测试结果表明:通过MBE沉积的Fe原子层在FeNiO界面处产生了约2ML的磁死层;而通过PLD沉积的Fe原子层在FeNiO界面处产生了约3ML的磁死层.X射线光电子能谱对FeNiO界面进行研究的结果表明,在Fe原子与单晶NiO间发生了界面化学反应.
1-10 Fe atomic layers (MLs) were wedge-shaped deposited onto an antiferromagnetic single crystal NiO (001) substrate by molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) The in-situ test results show that the Fe atomic layer deposited by MBE produced a magnetic dead layer of about 2 ML at the FeNiO interface and the Fe atomic layer deposited by PLD produced a magnetic dead layer of about 3 ML at the FeNiO interface. The results of photoelectron spectroscopy on the FeNiO interface show that interfacial chemical reaction occurs between the Fe atom and single crystal NiO.