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在英国召开的“半导体物理国际会议”上,日本富士通研究所和筑波大学宣布,合作开发出能控制量子计算机的基本要素——量子点大小和位置的技术。日本科学家利用原子显微镜(AFM)进行局部氧化和分子束外延(MBE)制成了量子计算机所必需的4个量子比特。这项研究虽然还没有能够最终确认其运行情况,但是这种方法被认为能相对简单地扩大集成电路的规模。这种新开发的技术是利用原子显微镜的探针接近 GaAs 基片后增加电压,使空气中的水分分解成氢和氢氧离子。实验表明,氧化力很强氢氧离子会氧化探针下面的 GaAs,使氧化部分形成凸出的点,点的直径可以通过电压的时间和改变氧化的时间来控制。在氧化后用蚀刻法洗净,除去氧化物,再利用原子显微镜使 GaAs 自生长,被氧化、蚀刻的凹部
At the International Conference on Semiconductor Physics in the UK, Fujitsu Research Laboratories of Japan and University of Tsukuba announced that they have worked together to develop technologies that control the basic elements of quantum computers - quantum dot size and placement. Japanese scientists used atomic force microscopy (AFM) for local oxidation and molecular beam epitaxy (MBE) to make the quantum computer necessary 4 quantum bits. Although this study has not been able to confirm its operation, this method is considered to be relatively simple to expand the scale of integrated circuits. The newly developed technology is the use of atomic microscopy probe near the GaAs substrate to increase the voltage, the air of water into hydrogen and hydroxyl ions. Experiments show that the strong oxidation of hydroxyl ions can oxidize GaAs under the probe, the oxidation part of the formation of bulging points, the diameter of the point can be controlled by the voltage of the time and change the oxidation time. After oxidation, it was washed by an etching method to remove the oxide, and then self-grown by an atomic microscope to be oxidized and etched into a concave portion