Supercritical carbon dioxide process for releasing stuck cantilever beams

• 作 者: 惠瑜 高超群 王磊 景玉鹏
• 机 构: Integrated Circuit Advanced Process Center,Institute of Microelectronics,Chinese Academy of Sciences
• 出 处: 半导体学报
• 发表日期: 2010年10期
• 关键词: stuck cantilever releasing supercritical dioxide specialized wafer length heatin

The multi-SCCO_2(supercritical carbon dioxide) release and dry process based on our specialized SCCO_2 semiconductor process equipment is investigated and the releasing mechanism is discussed.The experiment results show that stuck cantilever beams were held up again under SCCO_2 high pressure treatment and the repeatability of this process is nearly 100%.

The multi-SCCO_2 (supercritical carbon dioxide) release and dry process based on our specialized SCCO_2 semiconductor process equipment is investigated and the releasing mechanism is discussed. The experiment results show that stuck cantilever beams were held up again under SCCO_2 high pressure treatment and the repeatability of this process is nearly 100%.