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本文以部分相干光的衍射理论为基础，分析了掩模结构参量对衍射场分布的影响，讨论了光学邻近效应产生的物理机理，确定了其有效作用范围，为研究光学邻近效应校正打下了基础。
Based on the diffraction theory of partially coherent light, the influence of the parameters of the mask structure on the diffraction field distribution is analyzed. The physical mechanism of the optical proximity effect is discussed, and the effective range of the effect is discussed. This paper lays the foundation for the study of optical proximity correction .