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离子注入最初应用于控制半导体材料的成份上。由于应用这一工艺往往能使许多金属材料获得用传统方法所不能得到的成分和结构,因此近年逐渐引起人们的兴趣。与快速凝固或急冷工艺类似,离子注入
Ion implantation was originally used to control the composition of semiconductor materials. In recent years, there has been a growing interest in the application of this process, which often results in many metallic materials that can not be obtained by conventional methods. Similar to the rapid solidification or quenching process, ion implantation