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阐述了金属氧化物透明导电薄膜研究的发展情况及其应用前景。介绍了采用磁控溅射技术 ,使用混合气体Ar和O2 ,在衬底温度为 15 0～ 40 0℃的耐热玻璃基片上制备纳米晶SnO2 :Sb透明导电薄膜 ,通过测定X射线衍射谱 ,表明薄膜择优取向为 [110 ]和 [2 11]方向。测量了SnO2 :Sb薄膜的导电特性随衬底温度及氧分压的变化。光学特性测量结果表明薄膜具有较高的透过率。
The development of metal oxide transparent conductive film and its application prospect are expounded. The preparation of nanocrystalline SnO2: Sb transparent conductive thin film on a heat-resistant glass substrate with a substrate temperature of 15 0 ~ 40 0 ℃ by magnetron sputtering was studied. The X-ray diffraction (XRD) The results show that the preferred orientation of the films is [110] and [2 11] directions. The conductivities of SnO2: Sb films were measured with the substrate temperature and oxygen partial pressure. Optical characteristics measurements show that the film has a high transmittance.