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采用直流等离子体射流CVD法在硬质合金 (WC + 8wt.%Co)基体上生长金刚石膜 ,主要借助XRD分析方法对CVD金刚石膜的微观结构和残余应力进行了研究 ,探讨了CVD金刚石膜中残余应力的形成及其对金刚石膜粘附性能的影响。研究结果表明 :CVD金刚石膜中通常存在GPa数量级的残余压应力 ,膜中存在适中的残余压应力 ,有利于CVD金刚石膜获得最佳的粘附性能
The growth of diamond films on cemented carbide (WC + 8wt.% Co) substrates by direct current plasma jet CVD was studied by XRD. The microstructure and residual stress of CVD diamond films were investigated. Residual Stress Formation and Its Effect on Adhesion of Diamond Films. The results show that the residual compressive stress of GPa usually exists in CVD diamond films, and the moderate residual compressive stress exists in the films, which is in favor of obtaining the optimal adhesion of CVD diamond films