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近几年来,我们使用Fe_2O_3彩色版和正性胶复印光刻掩模,在一定程度上提高了掩模质量,保证了掩模版的大量供应。现将我们Fe_2O_3彩色版的制备和正性胶复印的情况介绍如下。 Fe_2O_3彩色版的制备 化学气相淀积法制备Fe_2O_3版具有设备简单,成本低,效率高和操作方便等优点。 Fe_2O_3版在使用上还有如下优点: 1.它对可见光透明而阻挡紫外光通过,因而允许在光刻时通过掩模直接观察片子上的图形。 2.正性抗蚀剂为提高光刻精度开辟了新的途径,使用彩色掩模便可减少由于使用正性抗蚀剂而采用大部分不透明的掩模给光刻对准带来的困难。 3.Fe_2O_3版由于吸收(而不是反射掉)不需要的光,因而相当地减小了晕光效应,加强了对反射性衬底的对比度,有利于精细线条光刻。减少了掩模的强烈反射光对光刻同志眼睛的刺激。 4.复印腐蚀特性比较好,在一定程度上减少了掩模缺陷。
In recent years, we use Fe_2O_3 color plate and positive glue to copy lithography mask, to a certain extent, improve the quality of the mask to ensure a large supply of reticle. Now we Fe_2O_3 color version of the preparation and positive plastic copy of the situation are described below. The preparation of Fe_2O_3 color plate The preparation of Fe_2O_3 plate by chemical vapor deposition has the advantages of simple equipment, low cost, high efficiency and easy operation. The Fe_2O_3 plate also has the following advantages in use: 1. It is transparent to visible light and blocks the passage of UV light, allowing the mask to directly observe the pattern on the film during lithography. 2. Positive Resists Open up new avenues for improving lithographic accuracy, using color masks to reduce the difficulties associated with lithographic alignment due to the use of most opaque masks with positive resists. 3. The Fe_2O_3 plate reduces the halo effect considerably by absorbing (rather than reflecting off) unwanted light, enhancing the contrast to the reflective substrate and facilitating fine line lithography. Reduces the irritation of the litho gay eyes by the strongly reflected light of the mask. 4. Copying corrosion is better, to a certain extent, reduce the mask defects.