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Electrochemical deposition method was employed to prepare CNx thin film from methanol-urea solution,and it was shown that adding a little acetic acid in the solution significantly affected the deposition process.After optimizing the experiment conditions,we obtained polycrystalline grains with sizes of about 3―7μm on the faces of single crystal silicon.X-ray diffraction spectrua indicate that the grains are mainly composed of cubic phase mixed with a small amount of β and α phases.
Electrochemical deposition method was employed to prepare CNx thin film from methanol-urea solution, and it was shown that adding a little acetic acid in the solution significantly affected the deposition process. After optimizing the experiment conditions, we obtained polycrystalline grains with sizes of about 3 -7μm on the faces of single crystal silicon. X-ray diffraction spectrua indicate that the grains are mainly composed of cubic phase mixed with a small amount of β and α phases.