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提供了用正交实验优化的化学镀脉冲电参数的适宜范围，研究了脉冲电流对化学镀液成分消耗量、ｐＨ值稳定性、沉积速度及镀层性能的影响。结果表明：脉冲化学镀在各方面均优于化学镀。脉冲化学镀镀层成分均匀稳定为镀层质量和施镀工艺过程的自动控制提供了有利依据。
The optimum range of electroless plating pulse parameters optimized by orthogonal experiment was provided. The effects of pulse current on the chemical composition consumption, pH stability, deposition rate and coating properties were studied. The results show that pulsed electroless plating is better than electroless plating in all aspects. The composition of pulse electroless plating is uniform and stable, which provides favorable basis for the automatic control of coating quality and plating process.