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本文主要是介绍BD-101型半导体表面钝化台.评述了用化学汽相淀积方法生长二氧化硅膜使硅表面钝化的工作.该项工作导致集成电路用的双极晶体管和绝缘栅场效应晶体管的性能和稳定性得到提高.
This paper mainly introduces the BD-101 semiconductor surface passivation table, and reviews the silicon dioxide film growth by chemical vapor deposition to passivate the silicon surface.This work has led to the development of bipolar transistors and insulated gate Field-effect transistor performance and stability are improved.