Density changes with substrate negative bias for ta-C films deposited by filter cathode vacuum arc

• 作 者: TAN Man-lin ZHU Jia-qi HAN Jie
• 机 构: Center of Composite Materials
• 出 处: 中国有色金属学会会刊（英文版）
• 发表日期: 2004年期
• 关键词: ta-C films substrate negative bias X-ray reflectivity density

Specular X-ray reflectivity (XRR) measurements were used to study the density and cross-section information of tetrahedral amorphous carbon (ta-C) films deposited by filter cathode vacuum arc(FCVA) system at different substrate bias. According to the correlation between density and substrate negative bias, it is found that the value of density reaches a maximum at -80 V bias. As the substrate bias increases or decreases, the density tends to lower gradually. Based on the density of diamond and graphite, sp3 bonding ratio of ta-C films was obtained from their corresponding density according to a simple equation between the two. And a similar parabolic variation was observed for ta-C films with the sp3 content changes with substrate negative bias. The mechanical properties such as hardness and elastic modulus were also measured and compared with the corresponding density for ta-C films. From the distribution of data points, a linear proportional correlation between them was found, which shows that the density is a critical parameter to characterize the structure variation for ta-C films.