论文部分内容阅读
对热丝法化学气相沉积金刚石膜过程的气氛进行了模拟与分析.使用GRI-Mech3.0甲烷燃烧过程C/H/O/N四元体系热化学反应机理和动力学数据,模拟并分析了HFCVD金刚石膜的C/H气相化学反应,通过对反应流的简单模拟得到了衬底位置气相组成,结果与前人实验数据吻合.探讨了灯丝温度、碳源浓度和碳源种类等因素变化对衬底位置气相组成的影响.结果表明甲基是金刚石膜生长最主要的前驱基团,其作用远高于乙炔,而超平衡态原子氢的存在对金刚石膜的质量至关重要.
The atmosphere of the hot-wire CVD CVD diamond film was simulated and analyzed.Using the thermochemical reaction mechanism and kinetic data of the C / H / O / N quaternary system of the methane combustion process of GRI-Mech3.0, The C / H gas-phase chemical reaction of HFCVD diamond films was carried out by simple simulation of the reaction flow, and the results were in good agreement with the previous experimental data. The changes of filament temperature, carbon source concentration and carbon source species were discussed The results show that methyl is the most important precursor for diamond film growth and its effect is much higher than that of acetylene. The presence of hyperbalanced atomic hydrogen is crucial to the quality of diamond films.