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选用V2O5为前驱物,通过在玻璃片上镀膜,利用高纯氢作为气源、高纯氮作为掺杂物,采用微波等离子体增强法,在低温条件下合成了具有优良热致相变特性的氮杂二氧化钒(VO2-xNy)薄膜。经过退火工艺的处理,采用XRD、SEM、AFM和相变温度测试对样品进行表征,结果表明:退火后VO2-xNy薄膜的表面没有太大的变化,但是退火后样品表面有裂纹出现,薄膜的晶体颗粒大小呈现正态分布,颗粒尺寸较均匀。退火有利于增加其纯度,改善样品结晶度,晶体尺寸长大,并且样品的相变温度降低,幅度约为8℃。
V2O5 was selected as the precursor. The films were coated with glass, high purity hydrogen was used as the gas source, high purity nitrogen was used as the dopant. Microwave assisted plasma enhanced method was used to synthesize azabenzopyrazine Vanadium oxide (VO2-xNy) film. After annealing process, the samples were characterized by XRD, SEM, AFM and phase transition temperature test. The results showed that the surface of VO2-xNy thin films did not change much after annealing, however, cracks appeared on the surface of samples after annealing. Crystalline particle size showed normal distribution, particle size is more uniform. Annealing helps to increase its purity, improve the crystallinity of the sample, the crystal size grows, and the phase transition temperature of the sample decreases by about 8 ℃.