,Total Ionizing Dose Effects of 55-nm Silicon-Oxide-Nitride-Oxide-Silicon Charge Trapping Memory in

来源 :中国物理快报(英文版) | 被引量 : 0次 | 上传用户:xicai2009
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The 60 Co-γ ray total ionizing dose radiation responses of 55-nm silicon-oxide-nitride-oxide-silicon (SONOS) memory cells in pulse mode (programmed/erased with pulse voltage) and dc mode (programmed/erased with direct voltage sweeping) are investigated.The threshold voltage and off-state current of memory cells before and after radiation are measured.The experimental results show that the memory cells in pulse mode have a better radiation-hard capability.The normalized memory window still remains at 60% for cells in dc mode and 76% for cells in pulse mode after 300 krad(Si) radiation.The charge loss process physical mechanisms of programmed SONOS devices during radiation are analyzed.
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