半导体电极测定氢氟酸

• 作 者: 曹希寿 李开华 吴佩丽 文真君
• 机 构: 中科院原子能研究所,
• 出 处: 理化检验.化学分册
• 发表日期: 1980年02期
• 关键词: 四氟化铀 半导体电极 电极测定 数字电压表 化学试剂 甘汞电极 铂电极 对电极 毫伏值 方法精度

本文报导 n-型 Si 半导体电极的制备和用于氢氟酸的测定,测定时无须加入任何化学试剂,几分钟内报出结果,测定纯 HF 范围为0.002～0.030N,测定 H_2SO_4,H_3PO_4,HCl,HNO_3中 HF 范围为0.010～0.080N,测定四氟化铀工艺溶液中 HF 范围0.150～0.600N,方法精密度为±2%;样品重加回收率最低87%。

This paper reports the preparation of n-type Si semiconductor electrodes and the determination of hydrofluoric acid without any addition of chemical reagents. The results are reported within a few minutes. The pure HF range is 0.002-0.030N. The determination of H 2 SO 4, H 3 PO 4, HCl , The HF range of HNO_3 was 0.010 ~ 0.080N, the HF range of 0.150 ~ 0.600N was determined in UF4 solution, the precision was ± 2%, and the recovery rate of sample was 87%.