Mo/Si multilayers used for the EUV normal incidence solar telescope

• 作 者: LIU Zhen YANG Lin CHEN Bo CHEN
• 机 构: StateKeyLaboratoryofAppliedOptics,GraduateUniversityofChineseAcademyofSciences
• 出 处: 中国科学：物理学、力学、天文学英文版
• 发表日期: 2011年3期
• 关键词: 极紫外望远镜 太阳望远镜 发病率 膜热稳定性 中心波长 钼 X射线衍射仪 高反射率 EUV solar telescope multilayer reflect
• 基金项目: This work was supported by the National Natural Science Foundation of China （Grant Nos. 40774098 and 10878004）.

This paper first reviews an EUV normal incidence solar telescope that we have developed in our lab. The telescope is composed of four EUV telescopes and the operation wavelengths are 13.0 nm, 17.1 nm, 19.5 nm, and 30.4 nm. These four wavelengths, fundamen