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采用反应非平衡磁控溅射技术在青铜及Si(100)衬底上沉积不同负偏压(Vb)的纳米ZrNbAlN薄膜。薄膜结构及成分采用X射线光电子能谱及X射线衍射进行表征。结果表明,Zr和Nb的原子浓度受负偏压影响,Vb导致N 1s谱和Al 2p谱的结合能增加及Zr 3d5/2和Nb 3d5/2谱的结合能降低,薄膜表面形貌的演化受控于Vb。X射线衍射谱显示这些薄膜具有(111)择优取向。此外,薄膜的力学特性及腐蚀行为分别通过纳米压痕测试及腐蚀测试表征。当负偏压为-70 V时,纳米压痕测试显示的最大显微硬度为21.85 GPa,ZrNbAlN膜在青铜衬底上的性能远优于未涂层处理的衬底。在0.5 mol/L NaCl和0.5 mol/L HCl溶液中的腐蚀实验表明,腐蚀势能及腐蚀电流依赖于衬底偏压,在-90 V时能够获得较高的抗腐蚀特性。
Nano-ZrNbAlN films with different negative bias (Vb) were deposited on bronze and Si (100) substrates by reactive imbalance magnetron sputtering. The structure and composition of the films were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. The results show that the atomic concentrations of Zr and Nb are affected by the negative bias. The binding energy of N 1s spectrum and Al 2p spectrum increases and the binding energy of Zr 3d 5/2 and Nb 3d 5/2 spectra decrease. The evolution of film surface morphology Controlled by Vb. X-ray diffraction spectra show that these films have a (111) preferred orientation. In addition, the mechanical properties and corrosion behavior of the films are characterized by nanoindentation and corrosion tests respectively. When the negative bias voltage is -70 V, the nano-indentation test shows a maximum microhardness of 21.85 GPa. The performance of ZrNbAlN film on bronze substrate is far better than that of uncoated substrate. Corrosion experiments in 0.5 mol / L NaCl and 0.5 mol / L HCl solution show that the corrosion potential and corrosion current depend on the substrate bias, and the higher corrosion resistance can be obtained at -90 V.