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研究了用铟锡合金靶直流磁控反应溅射制备ITO透明号电膜。介绍了膜的制备工艺和膜的特性。讨论了成膜过程和热处理对膜的电阻率和透光率的影响。
In this paper, indium tin alloy target DC magnetron reactive sputtering sputtering ITO transparent electric membrane. The preparation of the membrane and the characteristics of the membrane are introduced. The effects of film formation and heat treatment on the resistivity and transmittance of the films were discussed.