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作为表面处理技术之一的等离子体表面处理技术已经获得广泛的应用。等离子体表面处理方法的优点是利用其处理后的表面化学活性状态增快反应速度。在较低温度下,这类反应也能进行。在这种处理方法中,使置放在等离子体中的固体表面产生新的化合物,改变固体表面的性质。等离子体表面氧化是使半导体表面经过辉光放电处理形成表面氧化膜。若把试样放在等离子体中进行表面处理,试样会直接受到带电粒子的冲击。为了弥补这个缺点,可以在半导体上加盖保护膜,使其产生界面氧化。这个方法叫做界面氧化。作为保
As one of the surface treatment technologies, plasma surface treatment technology has been widely used. The advantage of the plasma surface treatment method is that it increases the reaction rate with its treated surface chemical active state. At lower temperatures, such reactions can proceed. In this method of treatment, placing the solid surface placed in the plasma creates a new compound that changes the properties of the solid surface. Plasma surface oxidation is the semiconductor surface glow discharge treatment to form a surface oxide film. If the sample is placed in the plasma surface treatment, the sample will be directly charged particles impact. In order to make up for this shortcoming, a protective film can be stamped on the semiconductor to make the interface oxidized. This method is called interfacial oxidation. As a security