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利用射频磁控溅射技术在(100)Si和玻璃衬底上沉积系列Mg掺杂ZnO(x=0~0.20)薄膜,XRD分析结果表明,Zn1-xMgxO薄膜均为六角纤锌矿结构,薄膜呈现出c轴择优生长特性,但随着x值的增加,晶格常数c逐渐减小。当x=0.20时,薄膜出现(100)面衍射峰,薄膜的c轴择优生长特性减弱。SEM分析表明,x=0.10时,薄膜表面平坦光滑,晶粒大小均匀,结构更加致密,结晶质量最佳。紫外可见光透射光谱表明,Mg的掺入提高薄膜在可见光范围内的透过率;同时增大了薄膜的禁带宽度;室温PL谱分析显示所有薄膜均出现了紫外发射峰和蓝光发射带,且紫外发射峰和蓝光发光带都随x值的增加而蓝移。
A series of Mg doped ZnO films (x = 0 ~ 0.20) were deposited on (100) Si and glass substrates by radio frequency magnetron sputtering. The XRD results showed that the films of Zn1-xMgxO were hexagonal wurtzite structure. C-axis preferred growth characteristics, but with the x value increases, the lattice constant c decreases. When x = 0.20, the (100) plane diffraction peak appears and the c-axis preferred growth characteristics of the film decrease. SEM analysis showed that the surface of the film is smooth and smooth, the grain size is uniform, the structure is more dense and the crystal quality is the best when x = 0.10. Ultraviolet visible light transmission spectra show that the incorporation of Mg improves the transmittance of the film in the visible light range and increases the forbidden band width of the film. The PL spectrum at room temperature shows that all films have UV emission peaks and blue emission bands The UV emission peak and the blue light emission band both shift blue with the increase of x value.