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用磁控溅射法在Si基底上制备了不同调制波长的SiC／W纳米多层膜。利用小角度X射线衍射技术（LXD），详细研究了其中典型的多层膜的调制周期性，各子层的厚度及界面平整度等界面微观结构。结果表明：磁控溅射法制备的纳米多层膜具有较好的周期结构及陡峭的界面梯度，由衍射峰位置计算出的界面不均匀度与子层厚度之比一般在5％以内。另外，对于小角度X射线衍射谱线中的所谓峰分裂现象进行了分析和计算。
SiC / W nano-multilayers with different modulation wavelengths were prepared on Si substrates by magnetron sputtering. The microstructure of interface, such as the periodicity of modulation, the thickness of each sublayers and the flatness of the interface, were investigated in detail using the small angle X-ray diffraction (LXD) technique. The results show that the nanostructured multi-layer films prepared by magnetron sputtering have good periodic structure and steep interface gradient. The ratio of interfacial inhomogeneity to sub-layer thickness calculated by the position of diffraction peaks is generally within 5%. In addition, the so-called peak splitting phenomenon in the small-angle X-ray diffraction lines was analyzed and calculated.