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在扫描束微细加工工艺中,包括抗蚀剂曝光,直接无掩模离子注入和微蚀刻加工,离子和电子起着互补的作用。一台单一的扫描束机,其离子束和电子束如能准确聚焦、相互精确对准是较为有益的。离子束和电子束应有共轴和短距离高分辨率透镜聚焦,这种要求可通过单静电透镜、组合磁和静电透镜得到满足。本文考虑了这些透镜以及组成这些透镜的整个探针形成系统。
In the scanning beam microfabrication process, including resist exposure, direct maskless ion implantation and micro-etching processes, ions and electrons play complementary roles. A single scanning beam machine, the ion beam and electron beam as accurate focus, accurate alignment with each other is more beneficial. The ion beam and the electron beam should have coaxial and short-range high-resolution lens focusing, which can be satisfied by single electrostatic lenses, combined magnetic and electrostatic lenses. This document considers these lenses as well as the entire probe formation system that makes up these lenses.