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金属/半导体基光子晶体有重大的国防应用价值,其生长技术的核心是设计合适的方法将聚甲基丙烯酯甲酯(PMMA)微球组装成光子晶体。在目前垂直沉积法的基础上,通过控制甲基丙烯酸甲酯(MMA)和偶氮引发剂的反应,使用等温蒸发工艺开发了光子晶体的可控垂直沉积(CVD)技术。实验合成了高度单分散的PMMA微球,并将PMMA微球组装成了光子晶体;对试样进行扫描电镜研究发现,晶体内部排列有序度很高,表面层很完美平整,在3μm×5μm的有序区内仅有两个点缺陷;使用直径分别为294nm和345nm的PMMA微球,沉积出具有规则的周期性密堆积结构的光子晶体,试样的完美有序区范围在20μm以上。实验发现,在可控垂直沉积法的晶体生长过程中,光子晶体的生长方式为连续生长,生长界面为粗造界面。
Metal / semiconductor-based photonic crystals are of great defense application value. The core of their growth technology is to design a suitable method to assemble polymethylmethacrylate (PMMA) microspheres into photonic crystals. Based on the current vertical deposition method, controlled vertical deposition (CVD) of photonic crystals was developed by controlling the reaction of methyl methacrylate (MMA) with azo initiators using an isothermal evaporation process. Highly monodispersed PMMA microspheres were synthesized by experiments. PMMA microspheres were assembled into photonic crystals. Scanning electron microscopy (SEM) analysis showed that the ordering degree of crystal was high and the surface layer was perfectly smooth. Only two point defects in the ordered region. The photonic crystals with regular periodic close-packed structure were deposited using PMMA microspheres with diameters of 294nm and 345nm, respectively. The perfect ordered region of the samples ranged from 20μm. The experimental results show that the growth mode of photonic crystal is continuous growth and the growth interface is rough interface during the crystal growth of controlled vertical deposition.