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本文对聚三甲基硅基丙炔(PTMSP)膜进行CF_4等离子体表面氟化研究。改性的PTMSP膜氧氮选择性显著提高(P_(O_2)/P_(N_2)=4-5,P_(O_2)=10~2-10~3barrer)。等离子体改性条件,如处理时间、单体压力、放电功率对PTMSP膜透气性的影响进行了研究。XPS谱分析表明改性后,膜表层化学组成发生了显著变化、碳硅含量大幅度减小,氟含量随着处理程度的增加而增加,氟碳比与膜的选择性有着密切的关系,当 F/C>1时,膜的P_(O_2)/P_(N_2)可达4以上。
In this paper, the polytrimethylsilyl propyne (PTMSP) membrane was investigated on the surface of CF 4 plasma fluorides. The selectivity of oxygen and nitrogen of the modified PTMSP membrane was significantly increased (P_ (O_2) / P_ (N_2) = 4-5, P_ (O_2) = 10 ~ 2-10 ~ 3barrer). The effects of plasma modification conditions such as treatment time, monomer pressure and discharge power on the permeability of PTMSP membrane were studied. XPS spectrum analysis showed that the chemical composition of the surface layer changed significantly after the modification, the content of silicon and carbon decreased significantly, the content of fluorine increased with the increase of the degree of treatment, and the ratio of fluorocarbon to carbon was closely related to the selectivity of the membrane. When F / C> 1, the membrane P_ (O_2) / P_ (N_2) up to 4 or more.