Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature l

• 作 者: 褚东凯 孙小燕 胡友旺 董欣然 银恺 罗志 周剑英 王聪 段吉安
• 机 构: The State Key Laboratory of High Performance Complex Manufacturing,College of Mechanical and Electri
• 出 处: Chinese Optics Letters
• 发表日期: 2017年07期
• 关键词: etching fused silica fabrication irradiation optimizing loose relaxation train i

A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability,the method of processing a high-temperature lattice by a femtosecond laser pulse train is provided. With the same pulse energy and scanning speed, the success probability can be increased to 98% by optimizing pulse delay.The enhancement is mainly caused by the nanostructure, which changes from a periodic slabs structure to some intensive and loose pore structures. In this Letter, the optimum pulse energy distribution ratio to the etching is also investigated.

A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability, the method of processing a high-temperature lattice by With the same pulse energy and scanning speed, the success probability can be increased to 98% by optimizing pulse delay. The enhancement is mainly caused by the nanostructure, which changes from a periodic slabs structure to some intensive and loose pore structures. In this Letter, the optimum pulse energy distribution ratio to the etching is also investigated.