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采用X射线反射(XRR)谱对同步辐射导致的氧化物薄膜的刻蚀进行了在位测试,结果表明波长为0.154nm的单色X光在室温下可对MgO和Cr2O3产生轻微的刻蚀。与文献中大量报道的同步辐射X射线光刻及烧蚀不同,这是单色X射线光刻的首次报道。尽管刻蚀速率极慢,但利用XRR谱的高分辨率,成功地检测到了膜厚的减薄。
X-ray reflectometry (XRR) spectra of synchrotron radiation oxide films were tested in situ. The results show that the monochromatic X-ray with a wavelength of 0.154nm can slightly etch MgO and Cr2O3 at room temperature. This is the first report of monochromatic X-ray lithography, which is different from the synchrotron radiation X-ray lithography and ablation widely reported in the literature. Despite the extremely slow etching rate, the thinning of the film thickness was successfully detected using the high resolution of the XRR spectrum.