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以三氯化硼、甲烷和氢气的混合气体为前驱体,利用磁悬浮天平热重系统研究了850～1200℃区间内化学气相沉积掺硼碳的原位动力学。探索了温度对沉积速率的影响,计算了该温度区间内沉积过程的表观活化能,同时借助SEM和EDS技术,测试了不同温度点(900℃、1000℃、1100℃和1200℃)沉积产物的微观结构和成分。结果表明,化学气相沉积掺硼碳属于典型的热激活反应过程;在所研究的温度区间内存在5种不同的反应控制机制;随着温度的升高,沉积产物的n(B)/n(C)和堆积密度都显著变小,说明高n(B)/n(C)和高致密度的掺硼碳涂层应在较低的温度下制备。
In situ mixed gas of boron trichloride, methane and hydrogen was used as precursors to study the in-situ kinetics of boron-carbon-doped chemical vapor deposition in the range of 850 ~ 1200 ℃ by using the magnetic levitation balance thermogravimetric system. The effect of temperature on the deposition rate was explored. The apparent activation energy of the deposition process was calculated. SEM and EDS techniques were used to test the deposition rate of the products at different temperature (900 ℃, 1000 ℃, 1100 ℃ and 1200 ℃) The microstructure and composition. The results show that chemical vapor deposition of boron-doped carbon belongs to the typical heat-activated reaction process. There are five different reaction control mechanisms in the studied temperature range. With the increase of temperature, the n (B) / n ( C and bulk densities are significantly smaller, indicating that high n (B) / n (C) and high density boron-doped carbon coatings should be prepared at lower temperatures.